Depth Profiling of Electronic Transport Properties in $$\mathrm{H}^{+}$$ H + -Implanted n-Type Silicon
Crossref DOI link: https://doi.org/10.1007/s10765-014-1716-z
Published Online: 2014-08-24
Published Print: 2015-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Tai, Rui
Wang, Chinhua
Hu, Jingpei
Mandelis, Andreas
Text and Data Mining valid from 2014-08-24