Stoichiometry of Silicon Dioxide Films Obtained by Ion-Beam Sputtering
Crossref DOI link: https://doi.org/10.1007/s10812-018-0613-9
Published Online: 2018-04-03
Published Print: 2018-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Telesh, E. V.
Dostanko, A. P.
Gurevich, O. V.
Text and Data Mining valid from 2018-03-01
Article History
Received: 13 July 2017
First Online: 3 April 2018