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Influence of n-Si Substrate Thickness and Doping Level on the Absorbing Properties of Silicon Plasmon Structures in the Infrared Range

Crossref DOI link: https://doi.org/10.1007/s10812-022-01293-w

Published Online: 2022-01-15

Published Print: 2022-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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