A new high-performance phototransistor design based on both surface texturization and graded gate doping engineering
Crossref DOI link: https://doi.org/10.1007/s10825-015-0752-7
Published Online: 2015-09-22
Published Print: 2016-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Djeffal, F.
Ferhati, H.
Text and Data Mining valid from 2015-09-22