Role of gradual gate doping engineering in improving phototransistor performance for ultra-low power applications
Crossref DOI link: https://doi.org/10.1007/s10825-015-0779-9
Published Online: 2015-12-21
Published Print: 2016-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ferhati, H.
Djeffal, F.
Text and Data Mining valid from 2015-12-21