Introduction of a metal strip in oxide region of junctionless tunnel field-effect transistor to improve DC and RF performance
Crossref DOI link: https://doi.org/10.1007/s10825-017-1032-5
Published Online: 2017-07-24
Published Print: 2017-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Tirkey, Sukeshni
Sharma, Dheeraj
Raad, Bhagwan Ram
Yadav, Dharmendra Singh
License valid from 2017-07-24