The origin of evolutionary device performance for GeGaInOx thin film transistor as a function of process pressure
Crossref DOI link: https://doi.org/10.1007/s10832-014-9978-1
Published Online: 2014-11-20
Published Print: 2015-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Du Ahn, Byung
Chung, Kwun-Bum
Park, Jin-Seong
Text and Data Mining valid from 2014-11-20
