Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
Crossref DOI link: https://doi.org/10.1007/s10832-016-0015-4
Published Online: 2016-02-23
Published Print: 2016-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lee, Ha-Jin
Park, Jin-Seong
Kwon, Se-Hun
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