Analytical Models for the Evaluation of Resistive Short Defect Detectability in Presence of Process Variations: Application to 28nm Bulk and FDSOI Technologies
Crossref DOI link: https://doi.org/10.1007/s10836-019-05776-1
Published Online: 2019-02-02
Published Print: 2019-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Karel, Amit
Azaïs, Florence
Comte, Mariane
Gallière, Jean-Marc
Renovell, Michel
Text and Data Mining valid from 2019-02-01
Article History
Received: 29 June 2018
Accepted: 18 January 2019
First Online: 2 February 2019