Graphene masks as passivation layers in the electrochemical etching of silicon
Crossref DOI link: https://doi.org/10.1007/s10853-014-8492-9
Published Online: 2014-08-02
Published Print: 2014-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Fang, Cheng
Shapter, Joseph George
Voelcker, Nicolas Hans
Ellis, Amanda Vera
Text and Data Mining valid from 2014-08-02