Crossmark

MOCVD growth and characterization of vanadium dioxide films

Crossref DOI link: https://doi.org/10.1007/s10853-016-0669-y

Published Online: 2016-12-27

Published Print: 2017-04

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Yakovkina, L. V.

Mutilin, S. V.

Prinz, V. Ya.

Smirnova, T. P.

Shayapov, V. R.

Korol’kov, I. V.

Maksimovsky, E. A.

Volchok, N. D.
Funding

Funding for this research was provided by:

Russian Science Foundation (15-12-00050)

Russian Science Foundation (15-12-00050)
License Information

License valid from 2016-12-27