Crossmark

Physical mechanism of surface blistering process in H-implanted Ge

Crossref DOI link: https://doi.org/10.1007/s10853-016-9842-6

Published Online: 2016-02-25

Published Print: 2016-06

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Dadwal, U.

Kumar, Praveen

Hähnel, A.

Singh, R.
Funding

Funding for this research was provided by:

Board of Research in Nuclear Sciences

Department of Electronics and Information Technology, Ministry of Communications and Information Technology
License Information

Text and Data Mining valid from 2016-02-25