Monitoring of stress–strain evolution in thin films by reflection anisotropy spectroscopy and synchrotron X-ray diffraction
Crossref DOI link: https://doi.org/10.1007/s10853-017-0909-9
Published Online: 2017-02-27
Published Print: 2017-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wyss, Andreas https://orcid.org/0000-0003-3966-5977
Sologubenko, Alla S.
Mishra, Nilesha
Gruber, Patric A.
Spolenak, Ralph
Funding for this research was provided by:
Helmholtz-Gemeinschaft (VI 530)
License valid from 2017-02-27