Microstructural transitions and dielectric properties of boron-doped amorphous alumina thin film
Crossref DOI link: https://doi.org/10.1007/s10853-017-1127-1
Published Online: 2017-04-27
Published Print: 2017-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Su, Zhen
Yao, Manwen
Li, Fei
Peng, Yong
Feng, Qian
Yao, Xi
Funding for this research was provided by:
the Ministry of Science and Technology of China through 973-project (2015CB654601)
National Science Foundation of China (51272177)
License valid from 2017-04-27