Thermal stability, structural and electrical characteristics of the modulated HfO2/Al2O3 films fabricated by atomic layer deposition
Crossref DOI link: https://doi.org/10.1007/s10853-017-1293-1
Published Online: 2017-06-19
Published Print: 2017-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Nie, Xianglong
Ma, Dayan
Ma, Fei
Xu, Kewei
License valid from 2017-06-19
