Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
Crossref DOI link: https://doi.org/10.1007/s10853-018-2099-5
Published Online: 2018-02-14
Published Print: 2018-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Chesnokov, Yu. M.
Miakonkikh, A. V.
Rogozhin, A. E.
Rudenko, K. V.
Vasiliev, A. L.
Text and Data Mining valid from 2018-02-14
Article History
Received: 7 December 2017
Accepted: 31 January 2018
First Online: 14 February 2018