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Structural and dielectric properties of ion beam deposited titanium oxynitride thin films

Crossref DOI link: https://doi.org/10.1007/s10853-018-2923-y

Published Online: 2018-09-21

Published Print: 2019-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Jia, Liuwei https://orcid.org/0000-0001-9297-0239
Lu, Huiping https://orcid.org/0000-0001-5620-9530
Ran, Yujing https://orcid.org/0000-0003-4042-5620
Zhao, Shujun https://orcid.org/0000-0002-0160-9948
Liu, Haonan https://orcid.org/0000-0002-7828-6112
Li, Yinglan https://orcid.org/0000-0001-6408-6016
Jiang, Zhaotan https://orcid.org/0000-0001-7683-3197
Wang, Zhi https://orcid.org/0000-0002-0680-4849
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Article History

Received: 20 May 2018

Accepted: 12 September 2018

First Online: 21 September 2018