Effects of double heat treatment of NiO hole transport layer on the performance of QLEDs
Crossref DOI link: https://doi.org/10.1007/s10853-020-05223-z
Published Online: 2020-09-14
Published Print: 2020-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, Sun-Kyo
Yang, Heesun
Kim, Yong-Seog https://orcid.org/0000-0002-3177-5058
Funding for this research was provided by:
Ministry of Science, ICT and Future Planning (2017R1A2B3008628)
Ministry of Education (2015R1A6A1A03031833)
Text and Data Mining valid from 2020-09-14
Version of Record valid from 2020-09-14
Article History
Received: 7 May 2020
Accepted: 30 August 2020
First Online: 14 September 2020