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Effect of ion control strategies on the deposition rate and properties of copper films in bipolar pulse high power impulse magnetron sputtering

Published Online: 2022-12-13

Published Print: 2023-01

Authors

Bai, Xuebing

Cai, Qun

Xie, Wenhao

Zeng, Yuqiao

Zhang, Xuhai https://orcid.org/0000-0001-5490-3721
Funding

Funding for this research was provided by:

National Natural Science Foundation of China (Grant No. 51771052, 51001026)
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Text and Data Mining valid from 2022-12-13

Version of Record valid from 2022-12-13
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Article History

Received: 13 October 2022

Accepted: 28 November 2022

First Online: 13 December 2022

Declarations

:

: The authors declare that they have no any competing financial interests or personal relationship that might be possible to disturb the work reported in this paper.

: Ethics approval was not required for this research.

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