Complex impedance spectroscopy of high-k HfO2 thin films in Al/HfO2/Si capacitor for gate oxide applications
Crossref DOI link: https://doi.org/10.1007/s10854-015-2862-1
Published Online: 2015-02-26
Published Print: 2015-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Nath, Madhuchhanda
Roy, Asim
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