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Effect of dopants on the epitaxial growth and oxygen diffusion behaviors of CeO2−δ buffer layer for coated conductors

Crossref DOI link: https://doi.org/10.1007/s10854-015-2914-6

Published Online: 2015-03-25

Published Print: 2015-06

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Wang, H.

Cao, L. Y.

Wang, Y.

Jin, L. H.

Liu, J. Y.

Huang, J. F.

Li, C. S.
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