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A comparative study of atomic layer deposition of Al2O3 and HfO2 on AlGaN/GaN

Crossref DOI link: https://doi.org/10.1007/s10854-015-2926-2

Published Online: 2015-03-13

Published Print: 2015-07

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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