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Effect of hydrogen-ion energy on structure of a-Si:H thin films prepared by ion-beam-assisted sputtering

Crossref DOI link: https://doi.org/10.1007/s10854-015-2998-z

Published Online: 2015-04-04

Published Print: 2015-07

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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