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Effects of substrate temperature on structural, optical and morphological properties of hydrogenated nanocrystalline silicon thin films prepared by inductively coupled plasma chemical vapor deposition

Crossref DOI link: https://doi.org/10.1007/s10854-015-3426-0

Published Online: 2015-07-05

Published Print: 2015-10

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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