Preparation of ScAlN films as a function of power density on Si and flexible substrate by dc reactive magnetron sputtering
Crossref DOI link: https://doi.org/10.1007/s10854-015-3733-5
Published Online: 2015-09-10
Published Print: 2016-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Li, Xiaomei
Yang, Yixi
Zhou, Dong
Yang, Chengtao
Feng, Fan
Yang, Junsong
Hu, Qijun
Funding for this research was provided by:
Fundamental Research Funds for the Central Universities of Ministry of Education of China
Text and Data Mining valid from 2015-09-10