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Annealing induced amorphous/crystalline silicon interface passivation by hydrogen atom diffusion

Published Online: 2015-10-07

Published Print: 2016-01

Authors

Dai, Xiaowan

Cai, Hongkun

Zhang, Dexian

Chen, Guifeng

Wang, Yong

Liu, Wei

Sun, Yun
Funding

Funding for this research was provided by:

Science and Technology Program of Hebei Province (15214305D)
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