Dependence of O2, N2 flow rate and deposition time on the structural, electrical and optical properties of SnO2 thin films deposited by atmospheric pressure chemical vapor deposition (APCVD)
Crossref DOI link: https://doi.org/10.1007/s10854-015-3835-0
Published Online: 2015-10-22
Published Print: 2016-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Fadavieslam, M. R.
Azimi-Juybari, H.
Marashi, M.
Text and Data Mining valid from 2015-10-22
