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Metal-assisted chemical etching of silicon 3D nanostructure using direct-alternating electric field

Crossref DOI link: https://doi.org/10.1007/s10854-015-3968-1

Published Online: 2015-11-05

Published Print: 2016-02

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Jiao, Xiaodong

Chao, Yan

Wu, Liqun

Yao, Anqi
Funding

Funding for this research was provided by:

National Natural Science Foundation of China (CN) (51175134)

Key Zhejiang Provincial Natural Science Foundation of China (LZ15E050004)
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