Investigations on high-κ dielectrics for low threshold voltage and low leakage zinc oxide thin-film transistor, using material selection methodologies
Crossref DOI link: https://doi.org/10.1007/s10854-016-4519-0
Published Online: 2016-02-18
Published Print: 2016-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kandpal, Kavindra
Gupta, Navneet
Text and Data Mining valid from 2016-02-18