Impact of post deposition annealing in O2 ambient on structural properties of nanocrystalline hafnium oxide thin film
Crossref DOI link: https://doi.org/10.1007/s10854-016-4663-6
Published Online: 2016-03-14
Published Print: 2016-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Pandey, Shilpi
Kothari, Prateek
Sharma, Sunil Kumar
Verma, Seema
Rangra, K. J.
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