Crossmark

Influences of rapid thermal annealing on the characteristics of Al2O3\La2O3\Si and La2O3\Al2O3\Si films deposited by atomic layer deposition

Crossref DOI link: https://doi.org/10.1007/s10854-016-4872-z

Published Online: 2016-04-29

Published Print: 2016-08

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Fei, Chenxi

Liu, Hongxia

Wang, Xing

Zhao, Dongdong

Wang, Shulong
Funding

Funding for this research was provided by:

Project of National Natural Science Foundation of China (61376099)

Project of National Natural Science Foundation of China (11235008)

Project of National Natural Science Foundation of China (61434007)

Specialized Research Fund for the Doctoral Program of High Education (20130203130002)
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