Influence of RF power on structural optical and electrical properties of hydrogenated nano-crystalline silicon (nc-Si:H) thin films deposited by PE-CVD
Crossref DOI link: https://doi.org/10.1007/s10854-016-5024-1
Published Online: 2016-05-24
Published Print: 2016-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jadhavar, Ashok
Pawbake, Amit
Waykar, Ravindra
Waman, Vaishali
Rondiya, Sachin
Shinde, Omkar
Kulkarni, Rupali
Rokade, Avinash
Bhorde, Ajinkya
Funde, Adinath
Patil, Dinkar
Pathan, Habib
Jadkar, Sandesh
Text and Data Mining valid from 2016-05-24