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The effect of annealing on the structural, optical and electrical properties of Titanium Nitride (TiN) thin films prepared by DC magnetron sputtering with supported discharge

Crossref DOI link: https://doi.org/10.1007/s10854-016-5130-0

Published Online: 2016-06-09

Published Print: 2016-10

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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