Effects of film thickness and sputtering power on properties of ITO thin films deposited by RF magnetron sputtering without oxygen
Crossref DOI link: https://doi.org/10.1007/s10854-016-5223-9
Published Online: 2016-07-06
Published Print: 2016-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Amalathas, Amalraj Peter
Alkaisi, Maan M.
License valid from 2016-07-06