Effects of processing parameters on crystalline structure and optoelectronic behavior of DC sputtered ITO thin film
Crossref DOI link: https://doi.org/10.1007/s10854-016-5591-1
Published Online: 2016-09-09
Published Print: 2017-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shakiba, M.
Kosarian, A.
Farshidi, E.
Funding for this research was provided by:
khuzestan Regional Electric Company, Ahvaz, Iran.
License valid from 2016-09-09