Band alignments of O3-based and H2O-based amorphous LaAlO3 films on silicon by atomic layer deposition
Crossref DOI link: https://doi.org/10.1007/s10854-016-5593-z
Published Online: 2016-09-23
Published Print: 2017-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhao, Lu
Liu, Hongxia
Wang, Xing
Feng, Xingyao
Fei, Chenxi
Funding for this research was provided by:
National Natural Science Foundation of China (61376099, 61434007)
Foundation for Fundamental Research of China (JSZL2016110B003)
License valid from 2016-09-23