The influence of La/Al atomic ratio on the dielectric constant and band-gap of stack-gate La–Al–O/SiO2 structure
Crossref DOI link: https://doi.org/10.1007/s10854-016-5757-x
Published Online: 2016-11-10
Published Print: 2017-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wang, Shulong
Liu, Hongxia
Zhang, Hailin
Funding for this research was provided by:
Project of National Natural Science Foundation of China (61376099)
License valid from 2016-11-10