Role of hydrogen treatment on microstructural and opto-electrical properties of amorphous ITO thin films deposited by reactive gas-timing DC magnetron sputtering
Crossref DOI link: https://doi.org/10.1007/s10854-017-6826-5
Published Online: 2017-04-03
Published Print: 2017-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kosarian, A.
Shakiba, M.
Farshidi, E.
Funding for this research was provided by:
Khuzestan Regional Electric Company, Ahvaz, Iran (IDOEMSAE12559)
License valid from 2017-04-03