Impact of Zr content on multiphase zirconium–tungsten oxide (Zr–WOx) films and its MIS structure of Cu/Zr–WOx/p-Si Schottky barrier diodes
Crossref DOI link: https://doi.org/10.1007/s10854-017-8187-5
Published Online: 2017-11-21
Published Print: 2018-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Marnadu, R.
Chandrasekaran, J. http://orcid.org/0000-0002-3911-9004
Raja, M.
Balaji, M.
Balasubramani, V.
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