Crossmark

A photoelectron study of annealing induced changes to workfunction and majority carrier type in pulsed laser deposited few layer WS2 films

Crossref DOI link: https://doi.org/10.1007/s10854-018-0135-5

Published Online: 2018-10-06

Published Print: 2018-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Rathod, Urmilaben P.

Jha, Jitendra Kumar

Voevodin, Andrey A.

Shepherd, Nigel D.
License Information

Text and Data Mining valid from 2018-10-06
More Information

Article History

Received: 14 March 2018

Accepted: 29 September 2018

First Online: 6 October 2018