Crossmark

Effects of Al2O3 buffer layer and annealing on the structural and optoelectronic properties of AZO films

Crossref DOI link: https://doi.org/10.1007/s10854-018-0341-1

Published Online: 2018-11-22

Published Print: 2019-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Lin, Chuanjin

Li, Xiuyan

Xu, Chunyao
Funding

Funding for this research was provided by:

Natural Science Foundation of Henan Province (2017-J01772)

Educational research projects for young and middle-aged teachers in Fujian (JT180302)
License Information

Text and Data Mining valid from 2018-11-22
More Information

Article History

Received: 26 August 2018

Accepted: 2 November 2018

First Online: 22 November 2018

Compliance with ethical standards

:

: No potential conflict of interest was reported by the authors.