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Understanding of post deposition annealing and substrate temperature effects on structural and electrical properties of Gd2O3 MOS capacitor

Crossref DOI link: https://doi.org/10.1007/s10854-018-8804-y

Published Online: 2018-02-22

Published Print: 2018-05

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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