An adhesion analysis of thin carbon films deposited onto curved and flat Ti6Al4V substrates using rf magnetron sputtering and plasma enhanced chemical vapor deposition techniques
Crossref DOI link: https://doi.org/10.1007/s10854-019-00817-z
Published Online: 2019-02-06
Published Print: 2019-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Laumer, Jonathan
O’Leary, Stephen K.
Funding for this research was provided by:
Natural Sciences and Engineering Research Council of Canada
Text and Data Mining valid from 2019-02-06
Article History
Received: 18 November 2018
Accepted: 23 January 2019
First Online: 6 February 2019