A novel method for source/drain ion implantation for 20 nm FinFETs and beyond
Crossref DOI link: https://doi.org/10.1007/s10854-019-01274-4
Published Online: 2019-04-08
Published Print: 2020-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Qin, Changliang
Yin, Huaxiang
Wang, Guilei
Zhang, Yanbo
Liu, Jinbiao
Zhang, Qinzhu
Zhu, Huilong
Zhao, Chao
Radamson, Henry H.
Text and Data Mining valid from 2019-04-08
Article History
Received: 26 December 2018
Accepted: 2 April 2019
First Online: 8 April 2019