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Influence of base pressure on property of sputtering deposited ITO film

Published Online: 2019-06-17

Published Print: 2019-07

Authors

Yang, Shumin

Zhong, Jingming

Sun, Benshuang

Zeng, Xueyun

Luo, Wen

Zhao, Xu

Shu, Yongchun

Chen, Jie

He, Jilin
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Text and Data Mining valid from 2019-06-17

Version of Record valid from 2019-06-17
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Article History

Received: 17 March 2019

Accepted: 5 June 2019

First Online: 17 June 2019

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