Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
Crossref DOI link: https://doi.org/10.1007/s10854-019-02459-7
Published Online: 2019-11-08
Published Print: 2019-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jha, Rajesh Kumar http://orcid.org/0000-0002-5903-8105
Singh, Prashant
Goswami, Manish
Singh, B. R.
Text and Data Mining valid from 2019-11-08
Version of Record valid from 2019-11-08
Article History
Received: 14 August 2019
Accepted: 28 October 2019
First Online: 8 November 2019