Rapid thermal annealing on the atomic layer-deposited zirconia thin film to enhance resistive switching characteristics
Crossref DOI link: https://doi.org/10.1007/s10854-019-02598-x
Published Online: 2019-11-26
Published Print: 2020-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Abbas, Yawar
Han, In Sub
Sokolov, Andrey Sergeevich
Jeon, Yu-Rim
Choi, Changhwan http://orcid.org/0000-0002-8386-3885
Text and Data Mining valid from 2019-11-26
Version of Record valid from 2019-11-26
Article History
Received: 21 May 2019
Accepted: 13 November 2019
First Online: 26 November 2019