Stressor SiNx contact etch stop layer (CESL) technology and its application in nano-scale transistors
Crossref DOI link: https://doi.org/10.1007/s10854-020-03553-x
Published Online: 2020-05-21
Published Print: 2020-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Xu, Qiang http://orcid.org/0000-0002-4010-0917
Xiong, Wenjuan
Wang, Guilei http://orcid.org/0000-0002-1311-8863
Ye, Tianchun
Text and Data Mining valid from 2020-05-21
Version of Record valid from 2020-05-21
Article History
Received: 26 March 2020
Accepted: 6 May 2020
First Online: 21 May 2020