Document is current

Any future updates will be listed below

Ag/HfO2-based conductive bridge memories elaborated by atomic layer deposition: impact of inert electrode and HfO2 crystallinity on resistive switching mechanisms

Crossref DOI link: https://doi.org/10.1007/s10854-020-03903-9

Published Online: 2020-07-08

Published Print: 2020-08

Update policy: https://doi.org/10.1007/springer_crossmark_policy

About CrossMark