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Investigation of BiFeO3/HfO2 gate stack for ferroelectric field effect transistors in IOT applications

Published Online: 2021-08-15

Published Print: 2021-09

Authors

Tripathi, Pramod Narayan https://orcid.org/0000-0002-7303-5234
Ojha, Sanjeev Kumar

Jha, Rajesh Kumar

Nazarov, Alexey
License Information

Text and Data Mining valid from 2021-08-15

Version of Record valid from 2021-08-15
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Article History

Received: 19 April 2021

Accepted: 31 July 2021

First Online: 15 August 2021

Declarations

:

: There are no conflicts of interest.

Document is current